First workshop organized by Reliability & Characterisation Cluster of PATENT-DfMM
7-8 October 2004, Sinaia, Romania

The first workshop of the Reliability & Characterisation Cluster of PATENT-DfMM network of excellence was held in Sinaia, Romania, 7-8 October, as a joint event with the IEEE International Semiconductor Conference (CAS 2004).

The program contained solely contributions given by cluster members: